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Based on the experience on fabricating the machines for TAB/COF production, Custom Equipment Fabrication for Special/Specified requirement, which is not served by Major Equipment Manufacturer, is also available to the fields of Semiconductor Manufacturing Equipment, MEMS manufacturing Equipment, LCD related manufacturing Equipment, Crystalline Sillicon Solar Cells manufacturing Equipment, where Easy-To-Use for Customer is pursued by us.
(1) Solution Temperature and Concentration Control
Temperature Control in Tank: ±0.2°C is controlled to a preset value
Concentration Control Accuracy: ±0.1%(KOH ETMAH) is controlled to a preset
The System for Solution Supply at any concentration and blend ratio
(2) Original Conveying Technology for Wafer Carrier
Original Technology such as Wiperlike Conveyance (Ferris Wheel Type)
Automatic Machine with Space-saving Design
Available to various size from 4" to 8"
(3) High Temperature Circulation Filtering System
Available to High Temperature Circulation Filtering(about 160°C Max) for heat phosphoric acid and sulfuric acid/hydrogen peroxide mixture (SPM)
Superior to rivals in Space-saving, Low Cost, High Accuracy Temperature Controll(±0.5°C)
(4) Etching Uniformity
Wafer Suface Variance Control (within ±5%) at batch for different etching treatments (SiN Film, SiO2 Film, various Metal Film, and Si etc.)
Equipable with Monitors for detecting the Finish of Metal Film Etching Variance Control at Lot
(5) Others
Equipment Design subject to match research facilities
Equipable with Solution Supply/Waste Fluid Collection System (possible for Cost Reduction if introduced together)
For Semiconductor
Spin Processor
Quartz Pipe Automatic Washing Machine
Wafer Automatic Washing Machine
Clean Draft for Acid and Alkali treatment
Spin Dryer
For MEMS
Silicon Anisotropic Etching Machine (TMAH EKOH)
SiO2 Etching Draft
Metal Etching Machine
For FPD
Etching Machine
Developing and Stripping Machine
Spin Cleaning Machine
Spin Processor SiO2 Etching Draft Spin Cleaning Machine for FPD